Array substrate and method of repairing broken lines therefor

ABSTRACT

The present invention provides an array substrate and method of repairing broken lines therefor, by forming a via on the organic layer corresponding to each intersection of the gate scan lines and the source-drain data lines, and deposing the second passivation layer in the via to form an aperture, with the vias, a U shape long line can be directly laser welded between the apertures at two ends of a broken line position to recover a connection of the broken gate scan line or the source-drain data line as the gate scan line or the source-drain data line on the substrate of the present invention is broken. The method of repairing saves the process of removing the organic layer with laser and effectively reduces the machine laser loss as removing the organic layer to raise the repair efficiency and the repair success rate. Thus, the display quality of the liquid crystal panel product is promoted.

FIELD OF THE INVENTION

The present invention relates to a display skill field, and moreparticularly to an array substrate and a method of repairing brokenlines for the array substrate.

BACKGROUND OF THE INVENTION

With the development of display technology, the flat panel device, suchas Liquid Crystal Display (LCD) possesses advantages of high imagequality, power saving, thin body and wide application scope. Thus, ithas been widely applied in various consumer electrical products, such asmobile phone, television, personal digital assistant, digital camera,notebook, laptop, and becomes the major display device.

Most of the liquid crystal displays on the present market are back lighttype liquid crystal displays, which comprise a liquid crystal displaypanel and a back light module. The working principle of the liquidcrystal display panel is to locate liquid crystal molecules between twoparallel glass substrates, and a plurality of vertical and horizontaltiny electrical wires are between the two glass substrates. The light ofback light module is reflected to generate images by applying drivingvoltages to control whether the liquid crystal molecules to be changeddirections.

Generally, the liquid crystal display panel comprises a CF (ColorFilter) substrate, a TFT (Thin Film Transistor) substrate, LC (LiquidCrystal) sandwiched between the CF substrate and TFT substrate andsealant. The formation process generally comprises: a forepart Arrayprocess (thin film, photo, etching and stripping), a middle Cell process(Lamination of the TFT substrate and the CF substrate) and a post moduleassembly process (Attachment of the driving IC and the printed circuitboard). The forepart Array process is mainly to form the TFT substratefor controlling the movement of the liquid crystal molecules; the middleCell process is mainly to add liquid crystal between the TFT substrateand the CF substrate; the post module assembly process is mainly thedriving IC attachment and the integration of the printed circuit board.Thus, the liquid crystal molecules are driven to rotate and displaypictures.

With the constant development of the liquid crystal panel technology,more and more new technologies have been applied in the thin filmtransistor array substrate, such as In-Plane Switching (IPS), FringeField Switching (FFS), Color Filter On Array (COA) and et cetera. Thesetechnologies have higher demands for the flatness of the displaysubstrate and generally, an organic layer, such as a color resist layer,a flat layer, which is thicker is required to be deposed on the arraysubstrate. During the manufacture process of the array substrate, theremay be broken line situations happening to the metal lines, includingthe scan lines and the data lines due to the effects of various reasons.For repairing such broken lines of the array substrate, the laserwelding is utilized for repairing the broken line position after thebroken line repairer removes the organic layer and the transparentelectrode, first. The broken line repair takes a lot of time. When theorganic layer cannot be completely removed, it can affect the brokenline repair success rate of the product.

SUMMARY OF THE INVENTION

An objective of the present invention is to provide an array substrate,and a plurality of apertures are formed on the surface of the arraysubstrate where correspond to the gate scan lines and source-drain datalines, and the apertures are formed at the via of the organic layer fordirectly laser welding a U shape long line between the apertures at twoends of a broken line position to raise the repair efficiency and therepair success rate as implementing broken line repair to the arraysubstrate of the present invention.

An objective of the present invention is further to provide a method ofrepairing broken lines for the array substrate, by directly laserwelding a U shape long line between the apertures at two ends of abroken line position to recover a connection of the broken gate scanline or the source-drain data line to save the process of removing theorganic layer with laser to raise the repair efficiency and the repairsuccess rate. Meanwhile, the machine laser loss as removing the organiclayer can be effectively reduced. Thus, the display quality of theliquid crystal panel product is promoted.

For realizing the aforesaid objectives, the present invention providesan array substrate, comprising: a substrate, gate scan lines on thesubstrate, a gate isolation layer on the gate scan lines and thesubstrate, source-drain data lines on the gate isolation layer, a firstpassivation layer on the source-drain data lines and the gate isolationlayer, an organic layer on the first passivation layer and a secondpassivation layer on the organic layer and the first passivation layer;

wherein, the gate scan lines and the source-drain data lines areperpendicularly and crosswise arranged on the substrate, and a via isformed on the organic layer corresponding to each intersection of thegate scan lines and the source-drain data lines, and the secondpassivation layer is deposed in the via to form an aperture.

A dimension of the aperture is 15 μm×15 μm.

The organic layer is a color resist layer or a flat layer.

Material of the first passivation layer and the second passivation layeris inorganic material.

A thickness of the organic layer is larger than thicknesses of the firstpassivation layer and the second passivation layer.

The substrate is a glass substrate.

A structure of the array substrate at the aperture comprises thesubstrate, the gate scan line, the gate isolation layer, thesource-drain data line, the first passivation layer and the secondpassivation layer.

The present invention further provides an array substrate, comprising: asubstrate, gate scan lines on the substrate, a gate isolation layer onthe gate scan lines and the substrate, source-drain data lines on thegate isolation layer, a first passivation layer on the source-drain datalines and the gate isolation layer, an organic layer on the firstpassivation layer and a second passivation layer on the organic layerand the first passivation layer;

wherein, the gate scan lines and the source-drain data lines areperpendicularly and crosswise arranged on the substrate, and a via isformed on the organic layer corresponding to each intersection of thegate scan lines and the source-drain data lines, and the secondpassivation layer is deposed in the via to form an aperture;

wherein a dimension of the aperture is 15 μm×15 μm;

wherein the organic layer is a color resist layer or a flat layer.

The present invention further provides a method of repairing brokenlines for the array substrate, as the gate scan lines or thesource-drain data lines are broken, a connection of the broken gate scanline or the source-drain data line is recovered by laser welding a Ushape long line between the apertures at two ends of a broken lineposition of the gate scan line or the source-drain data line.

Material of the U shape long line is tungsten carbonyl.

A dimension of the aperture is 15 μm×15 μm.

The benefits of the present invention are: the present inventionprovides an array substrate and method of repairing broken linestherefor, by forming a via on the organic layer corresponding to eachintersection of the gate scan lines and the source-drain data lines, anddeposing the second passivation layer in the via to form an aperture, aU shape long line can be directly laser welded between the apertures attwo ends of a broken line position to recover a connection of the brokengate scan line or the source-drain data line as the gate scan line orthe source-drain data line on the substrate of the present invention isbroken. The method of repairing saves the process of removing theorganic layer with laser and effectively reduces the machine laser lossas removing the organic layer to raise the repair efficiency and therepair success rate. Thus, the display quality of the liquid crystalpanel product is promoted.

In order to better understand the characteristics and technical aspectof the invention, please refer to the following detailed description ofthe present invention is concerned with the diagrams, however, providereference to the accompanying drawings and description only and is notintended to be limiting of the invention.

BRIEF DESCRIPTION OF THE DRAWINGS

The technical solution and the beneficial effects of the presentinvention are best understood from the following detailed descriptionwith reference to the accompanying figures and embodiments.

In drawings,

FIG. 1 is a structural diagram of an array substrate according to thepresent invention;

FIG. 2 is a sectional diagram along the A-A line at the aperture of thearray substrate shown in FIG. 1;

FIG. 3 is a sectional diagram along the B-B line at the aperture of thearray substrate shown in FIG. 1;

FIG. 4 is a diagram of repairing the broken gate scan line for the arraysubstrate shown in FIG. 1 by utilizing the method of laser welding Ushape long line;

FIG. 5 is a diagram of repairing the broken source-drain data line forthe array substrate shown in FIG. 1 by utilizing the method of laserwelding U shape long line.

DETAILED DESCRIPTION OF PREFERRED EMBODIMENTS

For better explaining the technical solution and the effect of thepresent invention, the present invention will be further described indetail with the accompanying drawings and the specific embodiments.

Please refer to FIG. 1-FIG. 3, which are embodiments of the arraysubstrate according to the present invention. The array substratecomprises: a substrate 1, gate scan lines 2 on the substrate 1, a gateisolation layer 4 on the gate scan lines 2 and the substrate 1,source-drain data lines 5 on the gate isolation layer 4, a firstpassivation layer 8 on the source-drain data lines 5 and the gateisolation layer 4, an organic layer 9 on the first passivation layer 8and a second passivation layer 10 on the organic layer 9 and the firstpassivation layer 8.

Specifically, the organic layer 9 is a color resist layer or a flatlayer; material of the first passivation layer 8 and the secondpassivation layer 10 is inorganic material; a thickness of the organiclayer 9 is larger than thicknesses of the first passivation layer 8 andthe second passivation layer 10; the substrate 1 is a glass substrate.

Specifically, the gate scan lines 2 and the source-drain data lines 5are perpendicularly and crosswise arranged on the substrate 1, and a viais formed on the organic layer 9 corresponding to each intersection ofthe gate scan lines 2 and the source-drain data lines 5, and the secondpassivation layer 10 is deposed in the via to form an aperture 11, andas shown in FIG. 2 and FIG. 3, a structure of the array substrate at theaperture 11 comprises the substrate 1, the gate scan line 2, the gateisolation layer 4, the source-drain data line 5, the first passivationlayer 8 and the second passivation layer 10.

Preferably, a dimension of the aperture 11 is 15 μm×15 μm.

The array substrate provided by the present invention, by formingapertures 11 on the second passivation layer 10 corresponding tointersections of the gate scan lines 2 and the source-drain data lines 5to be preserved as being the broken line repairing points for the gatescan lines 2 and the source-drain data lines 5. With the apertures 11,the broken lines can be repaired by laser welding U shape long line 15.

On the basis of the aforesaid array substrate structure, as shown inFIG. 4, FIG. 5, the method of repairing the broken lines for the arraysubstrate of the present invention by utilizing the method of laserwelding U shape long line comprises:

AS shown in FIG. 1 and FIG. 4, as the gate scan line 2 on the arraysubstrate is broken due to the deficient process, by laser welding a Ushape long line 15 between the apertures 11 on the gate scan line 2 attwo ends of a broken line position, the connection of the broken gatescan line 2 can be recovered.

As shown in FIG. 1 and FIG. 5, as the source-drain data lines 5 on thearray substrate is broken due to the deficient process, by laser weldinga U shape long line 15 between the apertures 11 on the source-drain datalines 5 at two ends of a broken line position, the connection of thebroken source-drain data lines 5 can be recovered.

Preferably, material of the U shape long line 15 utilized in theaforesaid method of repairing the broken lines for the array substrateis tungsten carbonyl.

In the method of repairing the broken lines for the array substrateshown in FIG. 4, FIG. 5, no organic layer 9 is formed in the aperture 11above the gate scan line 2 or the source-drain data lines 5 of the arraysubstrate, thus, the process of removing the organic layer 9 with laseris eliminated. By directly laser welding the U shape long line 15between the apertures 11 at two ends of the broken line position, thebroken line repairing to the gate scan line 2 or the source-drain datalines 5 can be accomplished to effectively reduce the machine laser lossas removing the organic layer and raise the repair efficiency and therepair success rate. Thus, the display quality of the liquid crystalpanel product is promoted.

In conclusion, the present invention provides an array substrate andmethod of repairing broken lines therefor, by forming a via on theorganic layer corresponding to each intersection of the gate scan linesand the source-drain data lines, and deposing the second passivationlayer in the via to form an aperture, a U shape long line can bedirectly laser welded between the apertures at two ends of a broken lineposition to recover a connection of the broken gate scan line or thesource-drain data line as the gate scan line or the source-drain dataline on the substrate of the present invention is broken. The method ofrepairing saves the process of removing the organic layer with laser andeffectively reduces the machine laser loss as removing the organic layerto raise the repair efficiency and the repair success rate. Thus, thedisplay quality of the liquid crystal panel product is promoted.

Above are only specific embodiments of the present invention, the scopeof the present invention is not limited to this, and to any persons whoare skilled in the art, change or replacement which is easily derivedshould be covered by the protected scope of the invention. Thus, theprotected scope of the invention should go by the subject claims.

What is claimed is:
 1. An array substrate, comprising: a substrate, gatescan lines on the substrate, a gate isolation layer on the gate scanlines and the substrate, source-drain data lines on the gate isolationlayer, a first passivation layer on the source-drain data lines and thegate isolation layer, an organic layer on the first passivation layerand a second passivation layer on the organic layer and the firstpassivation layer; wherein, the gate scan lines and the source-draindata lines are perpendicularly and crosswise arranged on the substrate,and a via is formed in the organic layer corresponding to eachintersection of the gate scan lines and the source-drain data lines, andthe second passivation layer is deposed in the via to form an aperture.2. The array substrate according to claim 1, wherein a dimension of theaperture is 15 μm×15 μm.
 3. The array substrate according to claim 1,wherein the organic layer is a color resist layer or a flat layer. 4.The array substrate according to claim 1, wherein material of the firstpassivation layer and the second passivation layer is inorganicmaterial.
 5. The array substrate according to claim 1, wherein athickness of the organic layer is larger than thicknesses of the firstpassivation layer and the second passivation layer.
 6. The arraysubstrate according to claim 1, wherein the substrate is a glasssubstrate.
 7. The array substrate according to claim 1, wherein astructure of the array substrate at the aperture comprises thesubstrate, the gate scan line, the gate isolation layer, thesource-drain data line, the first passivation layer and the secondpassivation layer.
 8. An array substrate, comprising: a substrate, gatescan lines on the substrate, a gate isolation layer on the gate scanlines and the substrate, source-drain data lines on the gate isolationlayer, a first passivation layer on the source-drain data lines and thegate isolation layer, an organic layer on the first passivation layerand a second passivation layer on the organic layer and the firstpassivation layer; wherein, the gate scan lines and the source-draindata lines are perpendicularly and crosswise arranged on the substrate,and a via is formed in the organic layer corresponding to eachintersection of the gate scan lines and the source-drain data lines, andthe second passivation layer is deposed in the via to form an aperture;wherein a dimension of the aperture is 15 μm×15 μm; wherein the organiclayer is a color resist layer or a flat layer.
 9. The array substrateaccording to claim 8, wherein material of the first passivation layerand the second passivation layer is inorganic material.
 10. The arraysubstrate according to claim 8, wherein a thickness of the organic layeris larger than thicknesses of the first passivation layer and the secondpassivation layer.
 11. The array substrate according to claim 8, whereinthe substrate is a glass substrate.
 12. The array substrate according toclaim 8, wherein a structure of the array substrate at the aperturecomprises the substrate, the gate scan line, the gate isolation layer,the source-drain data line, the first passivation layer and the secondpassivation layer.